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Gas-phase free radical reactions in the glow-discharge depo..:
Kampas, Frank J.
Journal of Applied Physics. 57 (1985) 6 - p. 2290-2291 , 1985
Link:
https://doi.org/10.1063/1.334378
RT Journal T1 <Title>Gas-phase free radical reactions in the glow-discharge deposition of hydrogenated amorphous silicon from silane and disilane</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.334378&Exemplar=1&LAN=DE A1 Kampas, Frank J. PB AIP Publishing YR 1985 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 57 IS 6 SP 2290 OP 2291 LK http://dx.doi.org/https://doi.org/10.1063/1.334378 DO https://doi.org/10.1063/1.334378 SF ELIB - SuUB Bremen
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