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1 Ergebnisse
1
Effects of rapid thermal oxidation on electrical characteri..:
Ting, W.
;
Li, P. C.
;
Lo, G. Q.
..
Journal of Applied Physics. 66 (1989) 11 - p. 5641-5643 , 1989
Link:
https://doi.org/10.1063/1.343676
RT Journal T1 <Title>Effects of rapid thermal oxidation on electrical characteristics of chemical-vapor-deposited SiO2 gate dielectrics</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.343676&Exemplar=1&LAN=DE A1 Ting, W. A1 Li, P. C. A1 Lo, G. Q. A1 Kwong, D. L. A1 Alvi, N. S. PB AIP Publishing YR 1989 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 66 IS 11 SP 5641 OP 5643 LK http://dx.doi.org/https://doi.org/10.1063/1.343676 DO https://doi.org/10.1063/1.343676 SF ELIB - SuUB Bremen
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