I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Growth of epitaxial C54 TiSi2 on Si(111) substrate by in si..:
Kim, Kun Ho
;
Lee, Jeoung Ju
;
Seo, Dong Ju
...
Journal of Applied Physics. 71 (1992) 8 - p. 3812-3815 , 1992
Link:
https://doi.org/10.1063/1.350895
RT Journal T1
Growth of epitaxial C54 TiSi2 on Si(111) substrate by in situ annealing in ultrahigh vacuum
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.350895&Exemplar=1&LAN=DE A1 Kim, Kun Ho A1 Lee, Jeoung Ju A1 Seo, Dong Ju A1 Choi, Chi Kyu A1 Hong, Sung Rak A1 Koh, Jeoung Dae A1 Kim, Sung Chul A1 Lee, Jeong Yong A1 Nicolet, Marc A. PB AIP Publishing YR 1992 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 71 IS 8 SP 3812 OP 3815 LK http://dx.doi.org/https://doi.org/10.1063/1.350895 DO https://doi.org/10.1063/1.350895 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)