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Epitaxial CoSi2 films on Si(100) by solid-phase reaction:
Vantomme, André
;
Nicolet, Marc-A.
;
Theodore, N. David
Journal of Applied Physics. 75 (1994) 8 - p. 3882-3891 , 1994
Link:
https://doi.org/10.1063/1.356033
RT Journal T1
Epitaxial CoSi2 films on Si(100) by solid-phase reaction
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.356033&Exemplar=1&LAN=DE A1 Vantomme, André A1 Nicolet, Marc-A. A1 Theodore, N. David PB AIP Publishing YR 1994 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 75 IS 8 SP 3882 OP 3891 LK http://dx.doi.org/https://doi.org/10.1063/1.356033 DO https://doi.org/10.1063/1.356033 SF ELIB - SuUB Bremen
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