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Temperature induced diffusion in Mo/Si multilayer mirrors:
Voorma, H.-J.
;
Louis, E.
;
Koster, N. B.
.
Journal of Applied Physics. 83 (1998) 9 - p. 4700-4708 , 1998
Link:
https://doi.org/10.1063/1.367258
RT Journal T1
Temperature induced diffusion in Mo/Si multilayer mirrors
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.367258&Exemplar=1&LAN=DE A1 Voorma, H.-J. A1 Louis, E. A1 Koster, N. B. A1 Bijkerk, F. PB AIP Publishing YR 1998 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 83 IS 9 SP 4700 OP 4708 LK http://dx.doi.org/https://doi.org/10.1063/1.367258 DO https://doi.org/10.1063/1.367258 SF ELIB - SuUB Bremen
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