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Oxidation of silicon nitride films in an oxygen plasma:
Kennedy, G. P.
;
Buiu, O.
;
Taylor, S.
Journal of Applied Physics. 85 (1999) 6 - p. 3319-3326 , 1999
Link:
https://doi.org/10.1063/1.369678
RT Journal T1 <Title>Oxidation of silicon nitride films in an oxygen plasma</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.369678&Exemplar=1&LAN=DE A1 Kennedy, G. P. A1 Buiu, O. A1 Taylor, S. PB AIP Publishing YR 1999 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 85 IS 6 SP 3319 OP 3326 LK http://dx.doi.org/https://doi.org/10.1063/1.369678 DO https://doi.org/10.1063/1.369678 SF ELIB - SuUB Bremen
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