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1 Ergebnisse
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Thermal stability of atomic layer deposited WCxNy electrode..:
Zonensain, Oren
;
Fadida, Sivan
;
Fisher, Ilanit
...
Journal of Applied Physics. 123 (2018) 3 - p. , 2018
Link:
https://doi.org/10.1063/1.5008515
RT Journal T1
Thermal stability of atomic layer deposited WCxNy electrodes for metal oxide semiconductor devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.5008515&Exemplar=1&LAN=DE A1 Zonensain, Oren A1 Fadida, Sivan A1 Fisher, Ilanit A1 Gao, Juwen A1 Danek, Michal A1 Eizenberg, Moshe PB AIP Publishing YR 2018 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 123 IS 3 LK http://dx.doi.org/https://doi.org/10.1063/1.5008515 DO https://doi.org/10.1063/1.5008515 SF ELIB - SuUB Bremen
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