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1 Ergebnisse
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High resistivity halide vapor phase homoepitaxial β-Ga2O3 f..:
Tadjer, Marko J.
;
Koehler, Andrew D.
;
Freitas Jr., Jaime A.
...
Applied Physics Letters. 113 (2018) 19 - p. , 2018
Link:
https://doi.org/10.1063/1.5045601
RT Journal T1
High resistivity halide vapor phase homoepitaxial β-Ga2O3 films co-doped by silicon and nitrogen
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.5045601&Exemplar=1&LAN=DE A1 Tadjer, Marko J. A1 Koehler, Andrew D. A1 Freitas Jr., Jaime A. A1 Gallagher, James C. A1 Specht, Matty C. A1 Glaser, Evan R. A1 Hobart, Karl D. A1 Anderson, Travis J. A1 Kub, Fritz J. A1 Thieu, Quang T. A1 Sasaki, Kohei A1 Wakimoto, Daiki A1 Goto, Ken A1 Watanabe, Shinya A1 Kuramata, Akito PB AIP Publishing YR 2018 SN 0003-6951 SN 1077-3118 JF Applied Physics Letters VO 113 IS 19 LK http://dx.doi.org/https://doi.org/10.1063/1.5045601 DO https://doi.org/10.1063/1.5045601 SF ELIB - SuUB Bremen
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