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1 Ergebnisse
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Two-step cycling process alternating implantation and remot..:
Renaud, Vincent
;
Petit-Etienne, Camille
;
Barnes, Jean-Paul
...
Journal of Applied Physics. 126 (2019) 24 - p. , 2019
Link:
https://doi.org/10.1063/1.5131030
RT Journal T1
Two-step cycling process alternating implantation and remote plasma etching for topographically selective etching: Application to Si3N4 spacer etching
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.5131030&Exemplar=1&LAN=DE A1 Renaud, Vincent A1 Petit-Etienne, Camille A1 Barnes, Jean-Paul A1 Bisserier, Jérémie A1 Joubert, Olivier A1 Pargon, Erwine PB AIP Publishing YR 2019 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 126 IS 24 LK http://dx.doi.org/https://doi.org/10.1063/1.5131030 DO https://doi.org/10.1063/1.5131030 SF ELIB - SuUB Bremen
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