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1 Ergebnisse
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Self-induced ferroelectric 2-nm-thick Ge-doped HfO2 thin fi..:
Lin, Yi-Wen
;
Sun, Chong-Jhe
;
Chang, Hao-Hsiang
...
Applied Physics Letters. 117 (2020) 26 - p. , 2020
Link:
https://doi.org/10.1063/5.0029628
RT Journal T1
Self-induced ferroelectric 2-nm-thick Ge-doped HfO2 thin film applied to Ge nanowire ferroelectric gate-all-around field-effect transistor
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_5.0029628&Exemplar=1&LAN=DE A1 Lin, Yi-Wen A1 Sun, Chong-Jhe A1 Chang, Hao-Hsiang A1 Huang, Yu-Hsien A1 Yu, Tung-Yuan A1 Wu, Yung-Chun A1 Hou, Fu-Ju PB AIP Publishing YR 2020 SN 0003-6951 SN 1077-3118 JF Applied Physics Letters VO 117 IS 26 LK http://dx.doi.org/https://doi.org/10.1063/5.0029628 DO https://doi.org/10.1063/5.0029628 SF ELIB - SuUB Bremen
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