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Regulating ferroelectricity in Hf0.5Zr0.5O2 thin films: Exp..:
Bai, Mingkai
;
Hong, Peizhen
;
Han, Runhao
...
Journal of Applied Physics. 134 (2023) 17 - p. , 2023
Link:
https://doi.org/10.1063/5.0170657
RT Journal T1
Regulating ferroelectricity in Hf0.5Zr0.5O2 thin films: Exploring the combined impact of oxygen vacancy and electrode stresses
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_5.0170657&Exemplar=1&LAN=DE A1 Bai, Mingkai A1 Hong, Peizhen A1 Han, Runhao A1 Chai, Junshuai A1 Zhang, Bao A1 Hou, Jingwen A1 Xiong, Wenjuan A1 Yang, Shuai A1 Gao, Jianfeng A1 Luo, Feng A1 Huo, Zongliang PB AIP Publishing YR 2023 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 134 IS 17 LK http://dx.doi.org/https://doi.org/10.1063/5.0170657 DO https://doi.org/10.1063/5.0170657 SF ELIB - SuUB Bremen
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