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Abatement of Sulfur Hexafluoride Emissions from the Semicon..:
Lee, How Ming
;
Chang, Moo Been
;
Wu, Kuan Yu
Journal of the Air & Waste Management Association. 54 (2004) 8 - p. 960-970 , 2004
Link:
https://doi.org/10.1080/10473289.2004.10470963
RT Journal T1 <Title>Abatement of Sulfur Hexafluoride Emissions from the Semiconductor Manufacturing Process by Atmospheric-Pressure Plasmas</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1080_10473289.2004.10470963&Exemplar=1&LAN=DE A1 Lee, How Ming A1 Chang, Moo Been A1 Wu, Kuan Yu PB Informa UK Limited YR 2004 SN 1096-2247 SN 2162-2906 JF Journal of the Air & Waste Management Association VO 54 IS 8 SP 960 OP 970 LK http://dx.doi.org/https://doi.org/10.1080/10473289.2004.10470963 DO https://doi.org/10.1080/10473289.2004.10470963 SF ELIB - SuUB Bremen
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