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Sputter yield amplification by tungsten doping of Al2O3 emp..:
Austgen, M
;
Koehl, D
;
Zalden, P
...
Journal of Physics D: Applied Physics. 44 (2011) 34 - p. 345501 , 2011
Link:
https://doi.org/10.1088/0022-3727/44/34/345501
RT Journal T1 <Title>Sputter yield amplification by tungsten doping of Al2O3 employing reactive serial co-sputtering: process characteristics and resulting film properties</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_0022-3727_44_34_345501&Exemplar=1&LAN=DE A1 Austgen, M A1 Koehl, D A1 Zalden, P A1 Kubart, T A1 Nyberg, T A1 Pflug, A A1 Siemers, M A1 Berg, S A1 Wuttig, M PB IOP Publishing YR 2011 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 44 IS 34 SP 345501 LK http://dx.doi.org/https://doi.org/10.1088/0022-3727/44/34/345501 DO https://doi.org/10.1088/0022-3727/44/34/345501 SF ELIB - SuUB Bremen
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