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1 Ergebnisse
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Cryogenic etching processes applied to porous low-kmaterial..:
Leroy, F
;
Zhang, L
;
Tillocher, T
...
Journal of Physics D: Applied Physics. 48 (2015) 43 - p. 435202 , 2015
Link:
https://doi.org/10.1088/0022-3727/48/43/435202
RT Journal T1 <Title>Cryogenic etching processes applied to porous low-kmaterials using SF6/C4F8plasmas</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_0022-3727_48_43_435202&Exemplar=1&LAN=DE A1 Leroy, F A1 Zhang, L A1 Tillocher, T A1 Yatsuda, K A1 Maekawa, K A1 Nishimura, E A1 Lefaucheux, P A1 de Marneffe, J-F A1 Baklanov, M R A1 Dussart, R PB IOP Publishing YR 2015 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 48 IS 43 SP 435202 LK http://dx.doi.org/https://doi.org/10.1088/0022-3727/48/43/435202 DO https://doi.org/10.1088/0022-3727/48/43/435202 SF ELIB - SuUB Bremen
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