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Comparative studies of MOS-gate/oxide-passivated AlGaAs/InG..:
Lee, Ching-Sung
;
Hung, Chun-Tse
;
Chou, Bo-Yi
...
Semiconductor Science and Technology. 27 (2012) 6 - p. 065006 , 2012
Link:
https://doi.org/10.1088/0268-1242/27/6/065006
RT Journal T1
Comparative studies of MOS-gate/oxide-passivated AlGaAs/InGaAs pHEMTs by using ozone water oxidation technique
UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_0268-1242_27_6_065006&Exemplar=1&LAN=DE A1 Lee, Ching-Sung A1 Hung, Chun-Tse A1 Chou, Bo-Yi A1 Hsu, Wei-Chou A1 Liu, Han-Yin A1 Ho, Chiu-Sheng A1 Lai, Ying-Nan PB IOP Publishing YR 2012 SN 0268-1242 SN 1361-6641 JF Semiconductor Science and Technology VO 27 IS 6 SP 065006 LK http://dx.doi.org/https://doi.org/10.1088/0268-1242/27/6/065006 DO https://doi.org/10.1088/0268-1242/27/6/065006 SF ELIB - SuUB Bremen
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