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Characterization of CMOS programmable multi-beam blanking a..:
Eder Kapl, Stefan
;
Loeschner, Hans
;
Piller, Walter
...
Journal of Micromechanics and Microengineering. 21 (2011) 4 - p. 045038 , 2011
Link:
https://doi.org/10.1088/0960-1317/21/4/045038
RT Journal T1
Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning
UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_0960-1317_21_4_045038&Exemplar=1&LAN=DE A1 Eder Kapl, Stefan A1 Loeschner, Hans A1 Piller, Walter A1 Witt, Martin A1 Pilz, Wolfgang A1 Letzkus, Florian A1 Jurisch, Michael A1 Irmscher, Mathias A1 Platzgummer, Elmar PB IOP Publishing YR 2011 SN 0960-1317 SN 1361-6439 JF Journal of Micromechanics and Microengineering VO 21 IS 4 SP 045038 LK http://dx.doi.org/https://doi.org/10.1088/0960-1317/21/4/045038 DO https://doi.org/10.1088/0960-1317/21/4/045038 SF ELIB - SuUB Bremen
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