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1 Ergebnisse
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Stress relaxation in dual ion beam sputtered Nb2O5and SiO2t..:
Ullah, Anayat
;
Wilke, Hans
;
Memon, Imran
...
Journal of Micromechanics and Microengineering. 25 (2015) 5 - p. 055019 , 2015
Link:
https://doi.org/10.1088/0960-1317/25/5/055019
RT Journal T1 <Title>Stress relaxation in dual ion beam sputtered Nb2O5and SiO2thin films: application in a Fabry–Pérot filter array with 3D nanoimprinted cavities</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_0960-1317_25_5_055019&Exemplar=1&LAN=DE A1 Ullah, Anayat A1 Wilke, Hans A1 Memon, Imran A1 Shen, Yannan A1 Nguyen, Duc Toan A1 Woidt, Carsten A1 Hillmer, Hartmut PB IOP Publishing YR 2015 SN 0960-1317 SN 1361-6439 JF Journal of Micromechanics and Microengineering VO 25 IS 5 SP 055019 LK http://dx.doi.org/https://doi.org/10.1088/0960-1317/25/5/055019 DO https://doi.org/10.1088/0960-1317/25/5/055019 SF ELIB - SuUB Bremen
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