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Patterned thick photoresist layers for protection of protru..:
Indermühle, P-F
;
Roth, S
;
Dellmann, L
.
Journal of Micromechanics and Microengineering. 8 (1998) 2 - p. 74-76 , 1998
Link:
https://doi.org/10.1088/0960-1317/8/2/007
RT Journal T1 <Title>Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_0960-1317_8_2_007&Exemplar=1&LAN=DE A1 Indermühle, P-F A1 Roth, S A1 Dellmann, L A1 Rooij, N F de PB IOP Publishing YR 1998 SN 0960-1317 SN 1361-6439 JF Journal of Micromechanics and Microengineering VO 8 IS 2 SP 74 OP 76 LK http://dx.doi.org/https://doi.org/10.1088/0960-1317/8/2/007 DO https://doi.org/10.1088/0960-1317/8/2/007 SF ELIB - SuUB Bremen
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