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1 Ergebnisse
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Etching characteristics of Pb(Zr,Ti)O3, Pt, SiO2and Si3N4in..:
Efremov, Alexander
;
Min, Nam Ki
;
Jeong, Jaehwa
..
Plasma Sources Science and Technology. 19 (2010) 4 - p. 045020 , 2010
Link:
https://doi.org/10.1088/0963-0252/19/4/045020
RT Journal T1
Etching characteristics of Pb(Zr,Ti)O3, Pt, SiO2and Si3N4in an inductively coupled HBr/Ar plasma
UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_0963-0252_19_4_045020&Exemplar=1&LAN=DE A1 Efremov, Alexander A1 Min, Nam Ki A1 Jeong, Jaehwa A1 Kim, Youngkeun A1 Kwon, Kwang-Ho PB IOP Publishing YR 2010 SN 0963-0252 SN 1361-6595 JF Plasma Sources Science and Technology VO 19 IS 4 SP 045020 LK http://dx.doi.org/https://doi.org/10.1088/0963-0252/19/4/045020 DO https://doi.org/10.1088/0963-0252/19/4/045020 SF ELIB - SuUB Bremen
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