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Determination of etching parameters for pulsed XeF2etching ..:
Sarkar, Dipta
;
Baboly, M G
;
Elahi, M M
...
Journal of Micromechanics and Microengineering. 28 (2018) 4 - p. 045007 , 2018
Link:
https://doi.org/10.1088/1361-6439/aaa74e
RT Journal T1 <Title>Determination of etching parameters for pulsed XeF2etching of silicon using chamber pressure data</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6439_aaa74e&Exemplar=1&LAN=DE A1 Sarkar, Dipta A1 Baboly, M G A1 Elahi, M M A1 Abbas, K A1 Butner, J A1 Piñon, D A1 Ward, T L A1 Hieber, Tyler A1 Schuberth, Austin A1 Leseman, Z C PB IOP Publishing YR 2018 SN 0960-1317 SN 1361-6439 JF Journal of Micromechanics and Microengineering VO 28 IS 4 SP 045007 LK http://dx.doi.org/https://doi.org/10.1088/1361-6439/aaa74e DO https://doi.org/10.1088/1361-6439/aaa74e SF ELIB - SuUB Bremen
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