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1 Ergebnisse
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In situ dry cleaning of Si wafer using OF2/NH3 remote plasm..:
Park, Jin Woo
;
Chae, Myeong Gyoon
;
Kim, Doo San
...
Journal of Physics D: Applied Physics. 51 (2018) 44 - p. 445201 , 2018
Link:
https://doi.org/10.1088/1361-6463/aae182
RT Journal T1
In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_aae182&Exemplar=1&LAN=DE A1 Park, Jin Woo A1 Chae, Myeong Gyoon A1 Kim, Doo San A1 Lee, Won Oh A1 Song, Han Dock A1 Choi, Changhwan A1 Yeom, Geun Young PB IOP Publishing YR 2018 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 51 IS 44 SP 445201 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/aae182 DO https://doi.org/10.1088/1361-6463/aae182 SF ELIB - SuUB Bremen
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