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Spectral characterization of an industrial EUV light source..:
Torretti, F
;
Liu, F
;
Bayraktar, M
...
Journal of Physics D: Applied Physics. 53 (2019) 5 - p. 055204 , 2019
Link:
https://doi.org/10.1088/1361-6463/ab56d4
RT Journal T1 <Title>Spectral characterization of an industrial EUV light source for nanolithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_ab56d4&Exemplar=1&LAN=DE A1 Torretti, F A1 Liu, F A1 Bayraktar, M A1 Scheers, J A1 Bouza, Z A1 Ubachs, W A1 Hoekstra, R A1 Versolato, O PB IOP Publishing YR 2019 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 53 IS 5 SP 055204 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/ab56d4 DO https://doi.org/10.1088/1361-6463/ab56d4 SF ELIB - SuUB Bremen
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