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1 Ergebnisse
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Gate-first AlGaN/GaN HEMT technology for enhanced threshold..:
Cheng, Liang
;
Xu, Weizong
;
Pan, Danfeng
...
Journal of Physics D: Applied Physics. 54 (2020) 1 - p. 015105 , 2020
Link:
https://doi.org/10.1088/1361-6463/abb161
RT Journal T1 <Title>Gate-first AlGaN/GaN HEMT technology for enhanced threshold voltage stability based on MOCVD-grown in situ SiNx</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_abb161&Exemplar=1&LAN=DE A1 Cheng, Liang A1 Xu, Weizong A1 Pan, Danfeng A1 Liang, Huinan A1 Wang, Ronghua A1 Zhu, Youhua A1 Ren, Fangfang A1 Zhou, Dong A1 Ye, Jiandong A1 Chen, Dunjun A1 Zhang, Rong A1 Zheng, Youdou A1 Lu, Hai PB IOP Publishing YR 2020 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 54 IS 1 SP 015105 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/abb161 DO https://doi.org/10.1088/1361-6463/abb161 SF ELIB - SuUB Bremen
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