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Impact of chamber pressure and Si-doping on the surface mor..:
Bin Anooz, S
;
Grüneberg, R
;
Chou, T-S
...
Journal of Physics D: Applied Physics. 54 (2020) 3 - p. 034003 , 2020
Link:
https://doi.org/10.1088/1361-6463/abb6aa
RT Journal T1 <Title>Impact of chamber pressure and Si-doping on the surface morphology and electrical properties of homoepitaxial (100) β-Ga2O3thin films grown by MOVPE</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_abb6aa&Exemplar=1&LAN=DE A1 Bin Anooz, S A1 Grüneberg, R A1 Chou, T-S A1 Fiedler, A A1 Irmscher, K A1 Wouters, C A1 Schewski, R A1 Albrecht, M A1 Galazka, Z A1 Miller, W A1 Schwarzkopf, J A1 Popp, A PB IOP Publishing YR 2020 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 54 IS 3 SP 034003 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/abb6aa DO https://doi.org/10.1088/1361-6463/abb6aa SF ELIB - SuUB Bremen
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