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Magnetoresistive properties of cobalt thin films grown by p..:
Jullien, M
;
Chang, C S
;
Badie, L
...
Journal of Physics D: Applied Physics. 54 (2020) 10 - p. 105002 , 2020
Link:
https://doi.org/10.1088/1361-6463/abc582
RT Journal T1 <Title>Magnetoresistive properties of cobalt thin films grown by plasma-assisted atomic layer deposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_abc582&Exemplar=1&LAN=DE A1 Jullien, M A1 Chang, C S A1 Badie, L A1 Robert, S A1 Hehn, M A1 Lacour, D A1 Montaigne, F PB IOP Publishing YR 2020 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 54 IS 10 SP 105002 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/abc582 DO https://doi.org/10.1088/1361-6463/abc582 SF ELIB - SuUB Bremen
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