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1 Ergebnisse
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Effects of substrate termination on R on increase under str..:
Li, Feiyu
;
Wang, Ronghua
;
Huang, Huolin
...
Journal of Physics D: Applied Physics. 54 (2021) 26 - p. 265106 , 2021
Link:
https://doi.org/10.1088/1361-6463/abf44b
RT Journal T1 <Title>Effects of substrate termination on R on increase under stress in 650 V GaN power devices</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_abf44b&Exemplar=1&LAN=DE A1 Li, Feiyu A1 Wang, Ronghua A1 Huang, Huolin A1 Ren, Yongshuo A1 Ren, Guangshan A1 Liang, Zhuang A1 Zhou, Fubin A1 Cheng, Wanxi A1 Liang, Huinan PB IOP Publishing YR 2021 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 54 IS 26 SP 265106 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/abf44b DO https://doi.org/10.1088/1361-6463/abf44b SF ELIB - SuUB Bremen
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