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On the relationship between the plasma characteristics, the..:
Michiels, M
;
Hemberg, A
;
Godfroid, T
...
Journal of Physics D: Applied Physics. 54 (2021) 41 - p. 415202 , 2021
Link:
https://doi.org/10.1088/1361-6463/ac118e
RT Journal T1 <Title>On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_ac118e&Exemplar=1&LAN=DE A1 Michiels, M A1 Hemberg, A A1 Godfroid, T A1 Douheret, O A1 Colaux, J L A1 Moskovkin, P A1 Lucas, S A1 Caillard, A A1 Thomann, A-L A1 Laha, P A1 Terryn, H A1 Voué, M A1 Panepinto, A A1 Snyders, R A1 Konstantinidis, S PB IOP Publishing YR 2021 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 54 IS 41 SP 415202 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/ac118e DO https://doi.org/10.1088/1361-6463/ac118e SF ELIB - SuUB Bremen
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