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Thermal and plasma enhanced atomic layer deposition of ultr..:
O'Donnell, S
;
Jose, F
;
Shiel, K
...
Journal of Physics D: Applied Physics. 55 (2021) 8 - p. 085105 , 2021
Link:
https://doi.org/10.1088/1361-6463/ac360c
RT Journal T1 <Title>Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_ac360c&Exemplar=1&LAN=DE A1 O'Donnell, S A1 Jose, F A1 Shiel, K A1 Snelgrove, M A1 McFeely, C A1 McGill, E A1 O'Connor, R PB IOP Publishing YR 2021 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 55 IS 8 SP 085105 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/ac360c DO https://doi.org/10.1088/1361-6463/ac360c SF ELIB - SuUB Bremen
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