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1 Ergebnisse
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High-precision modeling of dynamic etching in high-power ma..:
Cui, Suihan
;
Chen, Qiuhao
;
Guo, Yuxiang
...
Journal of Physics D: Applied Physics. 55 (2022) 32 - p. 325203 , 2022
Link:
https://doi.org/10.1088/1361-6463/ac717b
RT Journal T1 <Title>High-precision modeling of dynamic etching in high-power magnetron sputtering</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_ac717b&Exemplar=1&LAN=DE A1 Cui, Suihan A1 Chen, Qiuhao A1 Guo, Yuxiang A1 Chen, Lei A1 Jin, Zheng A1 Li, Xiteng A1 Yang, Chao A1 Wu, Zhongcan A1 Su, Xiongyu A1 Ma, Zhengyong A1 Fu, Ricky K Y A1 Tian, Xiubo A1 Chu, Paul K A1 Wu, Zhongzhen PB IOP Publishing YR 2022 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 55 IS 32 SP 325203 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/ac717b DO https://doi.org/10.1088/1361-6463/ac717b SF ELIB - SuUB Bremen
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