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Plasma-enhanced atomic layer deposition of nickel and nicke..:
O'Donnell, S
;
O'Neill, D
;
Shiel, K
...
Journal of Physics D: Applied Physics. 56 (2023) 41 - p. 415302 , 2023
Link:
https://doi.org/10.1088/1361-6463/ace11a
RT Journal T1 <Title>Plasma-enhanced atomic layer deposition of nickel and nickel oxide on silicon for photoelectrochemical applications</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6463_ace11a&Exemplar=1&LAN=DE A1 O'Donnell, S A1 O'Neill, D A1 Shiel, K A1 Snelgrove, M A1 Jose, F A1 McFeely, C A1 O'Connor, R PB IOP Publishing YR 2023 SN 0022-3727 SN 1361-6463 JF Journal of Physics D: Applied Physics VO 56 IS 41 SP 415302 LK http://dx.doi.org/https://doi.org/10.1088/1361-6463/ace11a DO https://doi.org/10.1088/1361-6463/ace11a SF ELIB - SuUB Bremen
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