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1 Ergebnisse
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Ultra-thin and conformal epitaxial NiSi2 film on Si fins by..:
Yang, Yuancheng
;
Xuan, Haoran
;
Li, Xiaokang
...
Semiconductor Science and Technology. 35 (2020) 3 - p. 035014 , 2020
Link:
https://doi.org/10.1088/1361-6641/ab6bfa
RT Journal T1
Ultra-thin and conformal epitaxial NiSi2 film on Si fins by barrier-induced phase modulation (BPM) technique
UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6641_ab6bfa&Exemplar=1&LAN=DE A1 Yang, Yuancheng A1 Xuan, Haoran A1 Li, Xiaokang A1 Zhang, Baotong A1 Dong, Xiaoqiao A1 Sun, Shuang A1 Cai, Qifeng A1 Xu, Xiaoyan A1 An, Xia A1 Li, Ming PB IOP Publishing YR 2020 SN 0268-1242 SN 1361-6641 JF Semiconductor Science and Technology VO 35 IS 3 SP 035014 LK http://dx.doi.org/https://doi.org/10.1088/1361-6641/ab6bfa DO https://doi.org/10.1088/1361-6641/ab6bfa SF ELIB - SuUB Bremen
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