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1 Ergebnisse
1
Novel vertically stacked Ge0.85Si0.15nGAAFETs above a Si ch..:
Liu, Yi-Chun
;
Huang, Yu-Shiang
;
Lu, Fang-Liang
...
Semiconductor Science and Technology. 35 (2020) 5 - p. 055010 , 2020
Link:
https://doi.org/10.1088/1361-6641/ab78f9
RT Journal T1
Novel vertically stacked Ge0.85Si0.15nGAAFETs above a Si channel with low SS of 76 mV/dec by underneath Si channel and enhancedIon(1.7X atVOV=VDS= 0.5 V) by Ge0.85Si0.15channels
UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6641_ab78f9&Exemplar=1&LAN=DE A1 Liu, Yi-Chun A1 Huang, Yu-Shiang A1 Lu, Fang-Liang A1 Ye, Hung-Yu A1 Tu, Chien-Te A1 Liu, C W PB IOP Publishing YR 2020 SN 0268-1242 SN 1361-6641 JF Semiconductor Science and Technology VO 35 IS 5 SP 055010 LK http://dx.doi.org/https://doi.org/10.1088/1361-6641/ab78f9 DO https://doi.org/10.1088/1361-6641/ab78f9 SF ELIB - SuUB Bremen
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