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1 Ergebnisse
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Low contact resistivity of Ti/TiN/Al for NiSi2 on epitaxial..:
Sun, Shuang
;
Wang, JianHuan
;
Bi, Ran
...
Semiconductor Science and Technology. 36 (2021) 9 - p. 09LT01 , 2021
Link:
https://doi.org/10.1088/1361-6641/ac0a83
RT Journal T1 <Title>Low contact resistivity of Ti/TiN/Al for NiSi2 on epitaxial Si:P structure at full low-temperature process below 450 °C</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6641_ac0a83&Exemplar=1&LAN=DE A1 Sun, Shuang A1 Wang, JianHuan A1 Bi, Ran A1 Li, HaiXia A1 Li, XiaoKang A1 Zhang, BaoTong A1 Cai, QiFeng A1 An, Xia A1 Xu, XiaoYan A1 Huang, Ru A1 Zhang, JianJun A1 Li, Ming PB IOP Publishing YR 2021 SN 0268-1242 SN 1361-6641 JF Semiconductor Science and Technology VO 36 IS 9 SP 09LT01 LK http://dx.doi.org/https://doi.org/10.1088/1361-6641/ac0a83 DO https://doi.org/10.1088/1361-6641/ac0a83 SF ELIB - SuUB Bremen
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