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1 Ergebnisse
1
The impact of charges at the dielectric/channel interface o..:
Li, Ming-Hao
;
Li, Qiang
;
Hsu, Hsiao-Hsuan
...
Semiconductor Science and Technology. 38 (2023) 4 - p. 045003 , 2023
Link:
https://doi.org/10.1088/1361-6641/acb8a7
RT Journal T1
The impact of charges at the dielectric/channel interface on performance degradation in negative capacitance ferroelectric FETs
UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1361-6641_acb8a7&Exemplar=1&LAN=DE A1 Li, Ming-Hao A1 Li, Qiang A1 Hsu, Hsiao-Hsuan A1 Ying, Lei-Ying A1 Zhang, Bao-Ping A1 Zheng, Zhi-Wei PB IOP Publishing YR 2023 SN 0268-1242 SN 1361-6641 JF Semiconductor Science and Technology VO 38 IS 4 SP 045003 LK http://dx.doi.org/https://doi.org/10.1088/1361-6641/acb8a7 DO https://doi.org/10.1088/1361-6641/acb8a7 SF ELIB - SuUB Bremen
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