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A 110 nm CMOS process for fully-depleted pixel sensors:
Pancheri, L.
;
Olave, J.
;
Panati, S.
...
Journal of Instrumentation. 14 (2019) 6 - p. C06016-C06016 , 2019
Link:
https://doi.org/10.1088/1748-0221/14/06/c06016
RT Journal T1 <Title>A 110 nm CMOS process for fully-depleted pixel sensors</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_1748-0221_14_06_c06016&Exemplar=1&LAN=DE A1 Pancheri, L. A1 Olave, J. A1 Panati, S. A1 Rivetti, A. A1 Cossio, F. A1 Rolo, M. A1 Demaria, N. A1 Giubilato, P. A1 Pantano, D. A1 Mattiazzo, S. PB IOP Publishing YR 2019 SN 1748-0221 JF Journal of Instrumentation VO 14 IS 6 SP C06016 OP C06016 LK http://dx.doi.org/https://doi.org/10.1088/1748-0221/14/06/c06016 DO https://doi.org/10.1088/1748-0221/14/06/c06016 SF ELIB - SuUB Bremen
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