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Angle-dependent ion-beam etching of RuAl thin films for str..:
Hampel, Nils Alexander
;
Seifert, Marietta
;
Leszczynska, Barbara
.
Engineering Research Express. 6 (2024) 4 - p. 045001 , 2024
Link:
https://doi.org/10.1088/2631-8695/ad7936
RT Journal T1 <Title>Angle-dependent ion-beam etching of RuAl thin films for structuring GHz-frequency electronics</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1088_2631-8695_ad7936&Exemplar=1&LAN=DE A1 Hampel, Nils Alexander A1 Seifert, Marietta A1 Leszczynska, Barbara A1 Gemming, Thomas PB IOP Publishing YR 2024 SN 2631-8695 JF Engineering Research Express VO 6 IS 4 SP 045001 LK http://dx.doi.org/https://doi.org/10.1088/2631-8695/ad7936 DO https://doi.org/10.1088/2631-8695/ad7936 SF ELIB - SuUB Bremen
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