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Characterization of Plasma Process-Induced Low-Density Defe..:
Sato, Yoshihiro
;
Shibata, Satoshi
;
Yamada, Takayoshi
...
IEEE Journal of the Electron Devices Society. 10 (2022) - p. 769-777 , 2022
Link:
https://doi.org/10.1109/jeds.2022.3176321
RT Journal T1
Characterization of Plasma Process-Induced Low-Density Defect Creation by Lateral Junction Leakage
UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_jeds.2022.3176321&Exemplar=1&LAN=DE A1 Sato, Yoshihiro A1 Shibata, Satoshi A1 Yamada, Takayoshi A1 Nishimura, Kazuko A1 Yamasaki, Masayuki A1 Murakami, Masashi A1 Urabe, Keiichiro A1 Eriguchi, Koji PB Institute of Electrical and Electronics Engineers (IEEE) YR 2022 SN 2168-6734 JF IEEE Journal of the Electron Devices Society VO 10 SP 769 OP 777 LK http://dx.doi.org/https://doi.org/10.1109/jeds.2022.3176321 DO https://doi.org/10.1109/jeds.2022.3176321 SF ELIB - SuUB Bremen
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