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1 Ergebnisse
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Scaling Properties of Ru, Rh, and Ir for Future Generation ..:
Kim, Min-Sik
;
Shin, Keun Wook
;
Lee, Sang-Hoon
...
IEEE Journal of the Electron Devices Society. 11 (2023) - p. 399-405 , 2023
Link:
https://doi.org/10.1109/jeds.2023.3292298
RT Journal T1 <Title>Scaling Properties of Ru, Rh, and Ir for Future Generation Metallization</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_jeds.2023.3292298&Exemplar=1&LAN=DE A1 Kim, Min-Sik A1 Shin, Keun Wook A1 Lee, Sang-Hoon A1 Kim, Yongsub A1 Kim, Hyun-Mi A1 Kim, Sang-Koog A1 Shin, Hyeon-Jin A1 Kim, Ki-Bum PB Institute of Electrical and Electronics Engineers (IEEE) YR 2023 SN 2168-6734 JF IEEE Journal of the Electron Devices Society VO 11 SP 399 OP 405 LK http://dx.doi.org/https://doi.org/10.1109/jeds.2023.3292298 DO https://doi.org/10.1109/jeds.2023.3292298 SF ELIB - SuUB Bremen
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