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1 Ergebnisse
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Partially Isolated Dual Work Function Gate IGZO TFT With Ob..:
Bao, Yunjiao
;
Yan, Gangping
;
Cao, Lei
...
IEEE Journal of the Electron Devices Society. 12 (2024) - p. 637-644 , 2024
Link:
https://doi.org/10.1109/jeds.2024.3414469
RT Journal T1 <Title>Partially Isolated Dual Work Function Gate IGZO TFT With Obviously Reduced Leakage Current for 3D DRAMs</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_jeds.2024.3414469&Exemplar=1&LAN=DE A1 Bao, Yunjiao A1 Yan, Gangping A1 Cao, Lei A1 Niu, Chuqiao A1 Li, Qingkun A1 Sang, Guanqiao A1 Li, Lianlian A1 Wei, Yanzhao A1 Zhang, Xuexiang A1 Luo, Jie A1 Yang, Yanyu A1 Xu, Gaobo A1 Yin, Huaxiang PB Institute of Electrical and Electronics Engineers (IEEE) YR 2024 SN 2168-6734 JF IEEE Journal of the Electron Devices Society VO 12 SP 637 OP 644 LK http://dx.doi.org/https://doi.org/10.1109/jeds.2024.3414469 DO https://doi.org/10.1109/jeds.2024.3414469 SF ELIB - SuUB Bremen
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