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1 Ergebnisse
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High-Quality Silicon Surface Passivation by Thermal-ALD Dep..:
Tomer, Shweta
;
Devi, Meenakshi
;
Kumar, Abhishek
...
IEEE Journal of Photovoltaics. 13 (2023) 5 - p. 691-698 , 2023
Link:
https://doi.org/10.1109/jphotov.2023.3295876
RT Journal T1
High-Quality Silicon Surface Passivation by Thermal-ALD Deposited Hafnium Oxide Films
UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_jphotov.2023.3295876&Exemplar=1&LAN=DE A1 Tomer, Shweta A1 Devi, Meenakshi A1 Kumar, Abhishek A1 Laxmi, Shubha A1 Satapathy, Subhashree A1 Maurya, Kamlesh Kumar A1 Singh, Preetam A1 Pathi, Prathap A1 Vandana, Vandana PB Institute of Electrical and Electronics Engineers (IEEE) YR 2023 SN 2156-3381 SN 2156-3403 JF IEEE Journal of Photovoltaics VO 13 IS 5 SP 691 OP 698 LK http://dx.doi.org/https://doi.org/10.1109/jphotov.2023.3295876 DO https://doi.org/10.1109/jphotov.2023.3295876 SF ELIB - SuUB Bremen
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