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VIA-1 focused-ion-beam processes for device fabrication:
Kubena, R.L.
;
Anderson, C.L.
;
Seliger, R.L.
..
IEEE Transactions on Electron Devices. 28 (1981) 10 - p. 1253-1253 , 1981
Link:
https://doi.org/10.1109/t-ed.1981.20582
RT Journal T1 <Title>VIA-1 focused-ion-beam processes for device fabrication</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_t-ed.1981.20582&Exemplar=1&LAN=DE A1 Kubena, R.L. A1 Anderson, C.L. A1 Seliger, R.L. A1 Brault, R.G. A1 Miller, L.J. PB Institute of Electrical and Electronics Engineers (IEEE) YR 1981 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 28 IS 10 SP 1253 OP 1253 LK http://dx.doi.org/https://doi.org/10.1109/t-ed.1981.20582 DO https://doi.org/10.1109/t-ed.1981.20582 SF ELIB - SuUB Bremen
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