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1 Ergebnisse
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A Highly Efficient Annealing Process With Supercritical N2O..:
Wang, Menghua
;
Yang, Mingchao
;
Liu, Weihua
...
IEEE Transactions on Electron Devices. 68 (2021) 4 - p. 1841-1846 , 2021
Link:
https://doi.org/10.1109/ted.2021.3056995
RT Journal T1 <Title>A Highly Efficient Annealing Process With Supercritical N2O at 120 °C for SiO2/4H–SiC Interface</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2021.3056995&Exemplar=1&LAN=DE A1 Wang, Menghua A1 Yang, Mingchao A1 Liu, Weihua A1 Qi, Jinwei A1 Yang, Songquan A1 Han, Chuanyu A1 Geng, Li A1 Hao, Yue PB Institute of Electrical and Electronics Engineers (IEEE) YR 2021 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 68 IS 4 SP 1841 OP 1846 LK http://dx.doi.org/https://doi.org/10.1109/ted.2021.3056995 DO https://doi.org/10.1109/ted.2021.3056995 SF ELIB - SuUB Bremen
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