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1 Ergebnisse
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A Technology Path for Scaling Embedded FeRAM to 28 nm and B..:
Luo, Yuan-Chun
;
Hur, Jae
;
Wang, Zheng
...
IEEE Transactions on Electron Devices. 69 (2022) 1 - p. 109-114 , 2022
Link:
https://doi.org/10.1109/ted.2021.3131108
RT Journal T1 <Title>A Technology Path for Scaling Embedded FeRAM to 28 nm and Beyond With 2T1C Structure</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2021.3131108&Exemplar=1&LAN=DE A1 Luo, Yuan-Chun A1 Hur, Jae A1 Wang, Zheng A1 Shim, Wonbo A1 Khan, Asif Islam A1 Yu, Shimeng PB Institute of Electrical and Electronics Engineers (IEEE) YR 2022 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 69 IS 1 SP 109 OP 114 LK http://dx.doi.org/https://doi.org/10.1109/ted.2021.3131108 DO https://doi.org/10.1109/ted.2021.3131108 SF ELIB - SuUB Bremen
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