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1 Ergebnisse
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Performance Improvement by SiO₂ Hardmask in 100-nm InP-Base..:
Cao, Shurui
;
Feng, Ruize
;
Zhou, Fugui
...
IEEE Transactions on Electron Devices. 70 (2023) 5 - p. 2262-2267 , 2023
Link:
https://doi.org/10.1109/ted.2023.3262487
RT Journal T1 <Title>Performance Improvement by SiO₂ Hardmask in 100-nm InP-Based HEMTs for TMIC Applications</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2023.3262487&Exemplar=1&LAN=DE A1 Cao, Shurui A1 Feng, Ruize A1 Zhou, Fugui A1 Feng, Zhiyu A1 Ding, Peng A1 Su, Yongbo A1 Jin, Zhi PB Institute of Electrical and Electronics Engineers (IEEE) YR 2023 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 70 IS 5 SP 2262 OP 2267 LK http://dx.doi.org/https://doi.org/10.1109/ted.2023.3262487 DO https://doi.org/10.1109/ted.2023.3262487 SF ELIB - SuUB Bremen
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