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1 Ergebnisse
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Extremely High-κ Hf0.2Zr0.8O2 Gate Stacks Integrated Into E..:
Chen, Wei-Jen
;
Liu, Yi-Chun
;
Chen, Yun-Wen
...
IEEE Transactions on Electron Devices. 70 (2023) 12 - p. 6673-6679 , 2023
Link:
https://doi.org/10.1109/ted.2023.3315685
RT Journal T1 <Title>Extremely High-κ Hf0.2Zr0.8O2 Gate Stacks Integrated Into Eight Stacked Ge0.95Si0.05 Nanowires and Nanosheets nFETs to Boost ION</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2023.3315685&Exemplar=1&LAN=DE A1 Chen, Wei-Jen A1 Liu, Yi-Chun A1 Chen, Yun-Wen A1 Chen, Yu-Rui A1 Lin, Hsin-Cheng A1 Tu, Chien-Te A1 Huang, Bo-Wei A1 Liu, C. W. PB Institute of Electrical and Electronics Engineers (IEEE) YR 2023 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 70 IS 12 SP 6673 OP 6679 LK http://dx.doi.org/https://doi.org/10.1109/ted.2023.3315685 DO https://doi.org/10.1109/ted.2023.3315685 SF ELIB - SuUB Bremen
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