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1 Ergebnisse
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Effects of Al2O3 Interfacial Layer Thickness for HZO/InGaAs..:
Ko, Kyul
;
Ahn, Dae-Hwan
;
Suh, Hoyoung
..
IEEE Transactions on Electron Devices. 70 (2023) 12 - p. 6237-6243 , 2023
Link:
https://doi.org/10.1109/ted.2023.3326428
RT Journal T1 <Title>Effects of Al2O3 Interfacial Layer Thickness for HZO/InGaAs Ferroelectric Capacitors With Superior Polarization and MOS Interface Properties</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2023.3326428&Exemplar=1&LAN=DE A1 Ko, Kyul A1 Ahn, Dae-Hwan A1 Suh, Hoyoung A1 Ju, Byeong-Kwon A1 Han, Jae-Hoon PB Institute of Electrical and Electronics Engineers (IEEE) YR 2023 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 70 IS 12 SP 6237 OP 6243 LK http://dx.doi.org/https://doi.org/10.1109/ted.2023.3326428 DO https://doi.org/10.1109/ted.2023.3326428 SF ELIB - SuUB Bremen
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