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Investigation of Trap Evolution of Hf0.5Zr0.5O2 FeFET Durin..:
Tian, Fengbin
;
Sun, Xiaoqing
;
Li, Songwei
...
IEEE Transactions on Electron Devices. 71 (2024) 2 - p. 1040-1047 , 2024
Link:
https://doi.org/10.1109/ted.2023.3341905
RT Journal T1 <Title>Investigation of Trap Evolution of Hf0.5Zr0.5O2 FeFET During Endurance Fatigue by Gate Leakage Current</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2023.3341905&Exemplar=1&LAN=DE A1 Tian, Fengbin A1 Sun, Xiaoqing A1 Li, Songwei A1 Xu, Shuangshuang A1 Chai, Junshuai A1 Xiang, Jinjuan A1 Han, Kai A1 Wang, Yanrong A1 Xu, Hao A1 Zhang, Jing A1 Wang, Xiaolei A1 Wang, Wenwu PB Institute of Electrical and Electronics Engineers (IEEE) YR 2024 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 71 IS 2 SP 1040 OP 1047 LK http://dx.doi.org/https://doi.org/10.1109/ted.2023.3341905 DO https://doi.org/10.1109/ted.2023.3341905 SF ELIB - SuUB Bremen
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