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1 Ergebnisse
1
Antiferroelectric Hf0.25Zr0.75O2 With Ferroelectric Propert..:
Lin, Kun-Tao
;
Lo, Chieh
;
Chang, Shu-Chieh
..
IEEE Transactions on Electron Devices. 71 (2024) 2 - p. 1072-1077 , 2024
Link:
https://doi.org/10.1109/ted.2023.3347370
RT Journal T1 <Title>Antiferroelectric Hf0.25Zr0.75O2 With Ferroelectric Properties and Low Voltage Operation of AFeRAM and AFeFET by Using Low-Temperature Atomic Layer Deposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2023.3347370&Exemplar=1&LAN=DE A1 Lin, Kun-Tao A1 Lo, Chieh A1 Chang, Shu-Chieh A1 Tsai, Hsing-Tzu A1 Chao, Tien-Sheng PB Institute of Electrical and Electronics Engineers (IEEE) YR 2024 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 71 IS 2 SP 1072 OP 1077 LK http://dx.doi.org/https://doi.org/10.1109/ted.2023.3347370 DO https://doi.org/10.1109/ted.2023.3347370 SF ELIB - SuUB Bremen
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