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1 Ergebnisse
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Ferroelectricity of Hf0.5Zr0.5O2 Thin Film Induced at 350°C..:
Lee, Jaewook
;
Kim, Se Hyun
;
Choi, Hyojun
...
IEEE Transactions on Electron Devices. 71 (2024) 4 - p. 2690-2695 , 2024
Link:
https://doi.org/10.1109/ted.2024.3361846
RT Journal T1 <Title>Ferroelectricity of Hf0.5Zr0.5O2 Thin Film Induced at 350°C by Thermally Accelerated Nucleation During Atomic Layer Deposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2024.3361846&Exemplar=1&LAN=DE A1 Lee, Jaewook A1 Kim, Se Hyun A1 Choi, Hyojun A1 Jeong, Hyun Woo A1 Yang, Kun A1 Park, Ju Yong A1 Cho, Yong Hyeon A1 Park, Sang-Youn A1 Lee, Younghwan A1 Park, Min Hyuk PB Institute of Electrical and Electronics Engineers (IEEE) YR 2024 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 71 IS 4 SP 2690 OP 2695 LK http://dx.doi.org/https://doi.org/10.1109/ted.2024.3361846 DO https://doi.org/10.1109/ted.2024.3361846 SF ELIB - SuUB Bremen
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