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1 Ergebnisse
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Study of Endurance Performance of SiO2 Interfacial Layer Sc..:
Agarwal, A.
;
Walke, A. M.
;
Ronchi, N.
..
IEEE Transactions on Electron Devices. 71 (2024) 8 - p. 4619-4625 , 2024
Link:
https://doi.org/10.1109/ted.2024.3409204
RT Journal T1 <Title>Study of Endurance Performance of SiO2 Interfacial Layer Scaling Through O Scavenging in Si Channel n-FeFET With Si:HfO2 Ferroelectric Layer</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_ted.2024.3409204&Exemplar=1&LAN=DE A1 Agarwal, A. A1 Walke, A. M. A1 Ronchi, N. A1 Kao, K.-H. A1 Van Houdt, J. PB Institute of Electrical and Electronics Engineers (IEEE) YR 2024 SN 0018-9383 SN 1557-9646 JF IEEE Transactions on Electron Devices VO 71 IS 8 SP 4619 OP 4625 LK http://dx.doi.org/https://doi.org/10.1109/ted.2024.3409204 DO https://doi.org/10.1109/ted.2024.3409204 SF ELIB - SuUB Bremen
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